Issue 43, 2018

Gate-tunable and high optoelectronic performance in multilayer WSe2 P–N diode

Abstract

Two-dimensional (2D) material-based P–N junctions are unique building blocks for next-generation optoelectronics with the advantages of atomic thinness, flexibility and low cost. However, their device performances are limited due to either weak photo-absorption or low-quality junctions. Herein, we demonstrate a high-quality homogeneous and seamless P–N junction based on multilayer WSe2 instead of the reported monolayer structure or van der Waals junction and present its optoelectronic applications as a diode, photovoltaic cell and photodetector with high performances. Our WSe2 P–N junction exhibits ideal diode behaviour with an ideal factor close to 1 and rectifying ratio of 105. It also shows significant photovoltaic properties with VOC of ∼0.8 V and PCE of up to 6.2% under 635 nm light illumination. As a photodiode, it produces the maximum responsivity of 486 mA W−1, external quantum efficiency of ∼90%, fast speed below 4 ms and broadband spectral coverage up to the near-infrared region. This study demonstrates a high-performance 2D-based P–N diode as multifunctional optoelectronics in a single device, which holds promise to revolutionize electronic and optoelectronic technology.

Graphical abstract: Gate-tunable and high optoelectronic performance in multilayer WSe2 P–N diode

Supplementary files

Article information

Article type
Paper
Submitted
27 Aug 2018
Accepted
11 Oct 2018
First published
12 Oct 2018

J. Mater. Chem. C, 2018,6, 11673-11678

Gate-tunable and high optoelectronic performance in multilayer WSe2 P–N diode

Y. Yang, N. Huo and J. Li, J. Mater. Chem. C, 2018, 6, 11673 DOI: 10.1039/C8TC04295K

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