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Issue 35, 2018
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Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

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Abstract

Polycrystalline thin films of chromium doped tungsten disulphide (WS2) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) using bis(diethyldithiocarbamato)disulfidothioxo tungsten(VI) (WS3L2) and tris(diethyldithiocarbamato) chromium(III) [Cr(S2CNEt2)3] (CrL3) complexes as precursors in different molar ratios at 450 °C. The deposited films were characterised by p-XRD, SEM, and EDX and Raman spectroscopies. Chromium doping of up to 15 mol% was achieved in WS2 thin films.

Graphical abstract: Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

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Article information


Submitted
26 Apr 2018
Accepted
10 Aug 2018
First published
13 Aug 2018

J. Mater. Chem. C, 2018,6, 9537-9544
Article type
Paper

Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

G. Murtaza, S. P. Venkateswaran, A. G. Thomas, P. O'Brien and D. J. Lewis, J. Mater. Chem. C, 2018, 6, 9537
DOI: 10.1039/C8TC01991F

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