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Redox-assisted Multicomponent Deposition of Ultrathin Amorphous Metal Oxides on Arbitrary Substrates: Highly Durable Cobalt Manganese Oxyhydroxide for Efficient Oxygen Evolution

Abstract

Deposition of ultrathin multicomponent coatings (<10 nm) commonly encounters difficulties of discontinuous grains, elemental segregation, and specific limits of dimensions and physical properties of substrates. We present a large-scale, solution-processable deposition of metal oxides capable of diverse elemental combinations (ternary oxides of Fe, Mn, Co) and aqueous substrate-universal deposition (including non-conductive plastics). The redox-coupled film growth of amorphous binary cobalt manganese oxyhydroxide (CMOH) results in homogeneous elemental distribution, strong film adhesion and homogeneous integrity, lower sheet resistance (7.41 to 13.0×107 Ω/sq), and high visible light transparency (98.4%). The effects of deposition time, temperature, precursors, additives, and elemental ratios on film growth and compositions were investigated through cross-section, in-situ growth monitoring, and elemental analysis. Experimental studies and molecular dynamics (MD) simulation reveal the strong dependence of film thickness on precursor anions, where acetate anions are responsible for achieving ultrathin deposition (6-10 nm). Amorphous CMOH shows the higher OER activities (overpotentials of 0.39 V) and more durable stability compared to the crystalline counterparts and benchmark RuO2 (overpotential of 0.59 V). Various electrodes (Ni foam, carbon cloth, Cu foils, and glassy carbon) exhibit the significantly enhanced OER performance with CMOH coating.

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Publication details

The article was received on 13 Jun 2018, accepted on 02 Aug 2018 and first published on 03 Aug 2018


Article type: Paper
DOI: 10.1039/C8TA05629C
Citation: J. Mater. Chem. A, 2018, Accepted Manuscript
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    Redox-assisted Multicomponent Deposition of Ultrathin Amorphous Metal Oxides on Arbitrary Substrates: Highly Durable Cobalt Manganese Oxyhydroxide for Efficient Oxygen Evolution

    R. Jhang, C. Yang, M. Shih, J. Ho, Y. Tsai and C. Chen, J. Mater. Chem. A, 2018, Accepted Manuscript , DOI: 10.1039/C8TA05629C

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