Issue 18, 2018

Boosting supercapacitive performance of ultrathin mesoporous NiCo2O4 nanosheet arrays by surface sulfation

Abstract

Surface functionalization is as an effective way to modulate the electrochemical or photoelectrochemical properties of nanomaterials. Sulfated ultrathin mesoporous NiCo2O4 nanosheet arrays are fabricated based on a convenient galvanic displacement process, exhibiting stimulated chemical reactivity and boosted supercapacitive performance. This method not only realizes synchronization of synthesis and surface functionalization but also readily tailors the functionalizing degree of the sulfate-ion and surface reactivity of NiCo2O4 through adjusting the addition amount of the sulfur source. Moderately sulfated NiCo2O4 exhibits a capacitance activation in the first 2100 cycles and achieves the highest specific capacitance of up to 1113 F gāˆ’1, an increase of 57% over that of pristine NiCo2O4 during 5000 cycling tests at a high current density of 5 A gāˆ’1. Additionally, the sample displays an outstanding cycling performance with 166% capacitance retention. On the basis of structural characterization and surface chemical analysis, this research puts forward a scientific explanation for significantly boosting the electrochemical performance by surface sulfation. In addition, we present a facile route for fabricating sulfated metal oxides without post-processing for energy conversion and storage fields.

Graphical abstract: Boosting supercapacitive performance of ultrathin mesoporous NiCo2O4 nanosheet arrays by surface sulfation

Supplementary files

Article information

Article type
Paper
Submitted
10 Feb 2018
Accepted
11 Apr 2018
First published
12 Apr 2018

J. Mater. Chem. A, 2018,6, 8742-8749

Boosting supercapacitive performance of ultrathin mesoporous NiCo2O4 nanosheet arrays by surface sulfation

Y. You, M. Zheng, D. Jiang, F. Li, H. Yuan, Z. Zhai, L. Ma and W. Shen, J. Mater. Chem. A, 2018, 6, 8742 DOI: 10.1039/C8TA01442F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements