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Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators

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Abstract

In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.

Graphical abstract: Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators

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Publication details

The article was received on 19 Jul 2018, accepted on 31 Aug 2018 and first published on 03 Sep 2018


Article type: Paper
DOI: 10.1039/C8NR05831H
Citation: Nanoscale, 2018, Advance Article
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    Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators

    S. Rasappa, L. Schulte, S. Ndoni and T. Niemi, Nanoscale, 2018, Advance Article , DOI: 10.1039/C8NR05831H

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