Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 37, 2018
Previous Article Next Article

A water-processable cellulose-based resist for advanced nanofabrication

Author affiliations

Abstract

The ideal nanofabrication technique is one that allows the mass production of high resolution submicrometric features in a cost efficient and environmentally friendly fashion. A great step towards achieving this goal has been the development of nanoimprinting lithography, a procedure with tenths of nanometres resolution while being compatible with roll-to-roll manufacturing. However, an ecofriendly resist that can be efficiently combined with this process is still missing. In this work, we demonstrate the use of hydroxypropyl cellulose (HPC) as a biocompatible, biodegradable, and water processable resist for temperature assisted nanoimprint lithography (tNIL) by fabricating different photonic architectures. The cellulose derivative is easily patterned with submicrometric features with aspect ratios greater than 1 using an elastomeric stamp and a hot plate. Silicon photonic crystals and metal nanoparticle arrays are fabricated combining cellulose with traditional nanofrabrication processes such as spincasting, reactive ion etching and metal lift off. Furthermore, advanced nanofabrication possibilities are within reach by combining the HPC with traditional resists. In particular, poly(methyl methacrylate) and HPC stacks are easily produced by liquid phase processing, where one of the two materials can be selectively removed by developing in orthogonal solvents. This capability becomes even more interesting by including nanoimprinted layers in the stack, leading to the encapsulation of arrays of air features in the resist.

Graphical abstract: A water-processable cellulose-based resist for advanced nanofabrication

Back to tab navigation

Supplementary files

Article information


Submitted
14 Jun 2018
Accepted
16 Aug 2018
First published
17 Sep 2018

This article is Open Access

Nanoscale, 2018,10, 17884-17892
Article type
Paper

A water-processable cellulose-based resist for advanced nanofabrication

C. Dore, J. Osmond and A. Mihi, Nanoscale, 2018, 10, 17884
DOI: 10.1039/C8NR04851G

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. Material from this article can be used in other publications provided that the correct acknowledgement is given with the reproduced material and it is not used for commercial purposes.

Reproduced material should be attributed as follows:

  • For reproduction of material from NJC:
    [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the Centre National de la Recherche Scientifique (CNRS) and the RSC.
  • For reproduction of material from PCCP:
    [Original citation] - Published by the PCCP Owner Societies.
  • For reproduction of material from PPS:
    [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the European Society for Photobiology, the European Photochemistry Association, and RSC.
  • For reproduction of material from all other RSC journals:
    [Original citation] - Published by The Royal Society of Chemistry.

Information about reproducing material from RSC articles with different licences is available on our Permission Requests page.


Social activity

Search articles by author

Spotlight

Advertisements