Jump to main content
Jump to site search

Issue 38, 2018
Previous Article Next Article

n-Type Ohmic contact and p-type Schottky contact of monolayer InSe transistors

Author affiliations

Abstract

Owing to their few lateral dangling bonds and enhanced gate electrostatics, two-dimensional semiconductors have attracted much attention for the fabrication of channels in next-generation field-effect transistors (FETs). Herein, combining first-principle band structure calculations with more precise quantum transport simulations, we systematically explore the interface properties between monolayer (ML) indium selenide (InSe) and a sequence of common electrodes in an FET. The ML InSe band structure is damaged by Sc, Au, Cr, Pt, and Pd electrodes but identifiable in contact with Ag, Cu, In, graphene and ML O-terminated Cr2C electrodes. A lateral n-type Schottky contact is generated with Sc, Au, Cr, Pt, Pd, and ML graphene electrodes owing to Fermi level pinning originating from the metal-induced gap states, which feature a pinning factor of 0.32. Luckily, a highly desirable lateral n-type Ohmic contact is generated with the Ag, Cu, and In electrodes. The calculated contact polarity is in agreement with the available experimental results using Au, Cr, ML graphene, Ag, and In as electrodes. Remarkably, a lateral p-type Schottky contact is generated with ML O-terminated Cr2C despite the very high work function of ML InSe. Therefore, this study offers a deeper understanding of ML InSe device interfaces and instructions for the design of ML InSe transistors.

Graphical abstract: n-Type Ohmic contact and p-type Schottky contact of monolayer InSe transistors

Back to tab navigation

Supplementary files

Publication details

The article was received on 20 Jul 2018, accepted on 07 Sep 2018 and first published on 07 Sep 2018


Article type: Paper
DOI: 10.1039/C8CP04615H
Citation: Phys. Chem. Chem. Phys., 2018,20, 24641-24651
  •   Request permissions

    n-Type Ohmic contact and p-type Schottky contact of monolayer InSe transistors

    B. Shi, Y. Wang, J. Li, X. Zhang, J. Yan, S. Liu, J. Yang, Y. Pan, H. Zhang, J. Yang, F. Pan and J. Lu, Phys. Chem. Chem. Phys., 2018, 20, 24641
    DOI: 10.1039/C8CP04615H

Search articles by author

Spotlight

Advertisements