Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 31, 2018
Previous Article Next Article

Anodic dissolution growth of metal–organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopy

Author affiliations

Abstract

In situ electrochemical atomic force microscopy (ec-AFM) is utilised for the first time to probe the initial stages of metal–organic framework (MOF) coating growth via anodic dissolution. Using the example of the Cu MOF HKUST-1, real time surface analysis is obtained that supports and verifies many of the reaction steps in a previously proposed mechanism for this type of coating growth. No evidence is observed however for the presence or formation of Cu2O, which has previously been suggested to be both key for the formation of the coating and a potential explanation for the anomalously high adhesion strength of coatings obtained via this methodology. Supporting in situ electrochemical Raman spectroscopy also fails to detect the presence of any significant amount of Cu2O before or during the coating's growth process.

Graphical abstract: Anodic dissolution growth of metal–organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopy

Back to tab navigation

Article information


Submitted
09 May 2018
Accepted
22 Jun 2018
First published
25 Jun 2018

CrystEngComm, 2018,20, 4421-4427
Article type
Paper

Anodic dissolution growth of metal–organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopy

S. D. Worrall, M. A. Bissett, M. P. Attfield and R. A. W. Dryfe, CrystEngComm, 2018, 20, 4421
DOI: 10.1039/C8CE00761F

Social activity

Search articles by author

Spotlight

Advertisements