Issue 59, 2018

First complex oxide superconductor by atomic layer deposition

Abstract

We here report on atomic layer deposition (ALD) of the superconducting complex oxide La2−xSrxCuO4−y and provide details of the structural and electrical properties of such films. This is the first report on a complex oxide thin film with superconducting properties that has been deposited by atomic layer deposition.

Graphical abstract: First complex oxide superconductor by atomic layer deposition

Supplementary files

Article information

Article type
Communication
Submitted
22 Jun 2018
Accepted
03 Jul 2018
First published
03 Jul 2018

Chem. Commun., 2018,54, 8253-8256

First complex oxide superconductor by atomic layer deposition

H. H. Sønsteby, T. Aarholt, Ø. Prytz, H. Fjellvåg and O. Nilsen, Chem. Commun., 2018, 54, 8253 DOI: 10.1039/C8CC04998J

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