Issue 7, 2018

2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

Abstract

A 2D laser lithography protocol for controlled grafting of polymer brushes in a single-step is presented. A series of polyacrylates were grafted from silicon substrates via laser-induced copper-mediated radical polymerization. Film thicknesses up to 39 nm were reached within 125 μs of exposure to UV laser light (351 nm). Successful block copolymerization underpinned the controlled nature of the grafting methodology. The resolution of a small structure of grafted PHEA reached 270 μm and was limited by the type of laser used in the study. Further, a checkerboard pattern of PtBA and POEGA was produced and imaged via time-of-flight secondary ion mass spectrometry (ToF-SIMS), and X-ray photoelectron spectroscopy (XPS).

Graphical abstract: 2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

Supplementary files

Article information

Article type
Communication
Submitted
02 Nov 2017
Accepted
15 Dec 2017
First published
18 Dec 2017

Chem. Commun., 2018,54, 751-754

2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

J. Laun, Y. De Smet, E. Van de Reydt, A. Krivcov, V. Trouillet, A. Welle, H. Möbius, C. Barner-Kowollik and T. Junkers, Chem. Commun., 2018, 54, 751 DOI: 10.1039/C7CC08444G

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