Issue 5, 2017

Use of decomposable polymer-coated submicron Cu particles with effective additive for production of highly conductive Cu films at low sintering temperature

Abstract

A method for producing Cu films with low resistivity, based on low temperature sintering, is demonstrated. The Cu inks for preparing conductive Cu films consisted of Cu particles that were coated with a decomposable polymer (poly(propylenecarbonate), PPC) as well as a self-reducible copper formate/1-amino-2-propanol (CuF–IPA) complex as an additive. The sintering temperature used in this study was as low as 100 °C. Following sintering at a temperature of 100 °C, the lowest reported resistivity (8.8 × 10−7 Ω m) was achieved through the use of Cu-based metal–organic decomposition (MOD) inks. This was due to the dual promotional effects of the aminolysis of PPC with IPA and the pyrolysis of the CuF–IPA complex.

Graphical abstract: Use of decomposable polymer-coated submicron Cu particles with effective additive for production of highly conductive Cu films at low sintering temperature

Supplementary files

Article information

Article type
Paper
Submitted
09 Oct 2016
Accepted
28 Nov 2016
First published
29 Nov 2016
This article is Open Access
Creative Commons BY license

J. Mater. Chem. C, 2017,5, 1033-1041

Use of decomposable polymer-coated submicron Cu particles with effective additive for production of highly conductive Cu films at low sintering temperature

Y. Yong, M. T. Nguyen, T. Yonezawa, T. Asano, M. Matsubara, H. Tsukamoto, Y. Liao, T. Zhang, S. Isobe and Y. Nakagawa, J. Mater. Chem. C, 2017, 5, 1033 DOI: 10.1039/C6TC04360G

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