Electronic and transport behavior of doped armchair silicene nanoribbons exhibiting negative differential resistance and its FET performance†
In the present work, density functional theory (DFT) combined with non-equilibrium Green’s function (NEGF) formalism is performed. The electronic properties (band structure and density of states) and transport properties (transmission spectrum and I–V characteristics) of armchair silicene nanoribbons (ASiNRs) doped with various elements, such as Al, Ga, In, Tl, P, As, Sb and Bi, are investigated. The negative differential resistance is observed for each doped ASiNR. The most geometrically stable structure and the maximum peak current to valley current (Ip/Iv) ratio is observed in indium (In) doped ASiNRs. Finally, In doped ASiNRs are proposed for field effect transistor (ASiNR-FET) formation using the high dielectric constant value of lanthanum oxide (La2O3 = 29) at different applied gate voltages (−0.1 to 0.4 V). The In doped ASiNR device shows a negative differential resistance phenomenon, which can be controlled by an applied gate voltage. It is found that doping with In in the electrodes and scattering region provides a higher drain current, and higher Ion/Ioff and Ip/Iv ratios. Our results have great application in digital devices and memory devices, and high frequency applications for future nanoelectronics.