Volume 203, 2017
From the journal:

Faraday Discussions

The halogen bond in solution: general discussion

Christer B. Aakeröy, ORCID logo   Paul D. Beer, ORCID logo   Ngong Kodiah Beyeh,   Lee Brammer,   Mathieu Branca, ORCID logo   David L. Bryce, ORCID logo   Janet E. Del Bene, ORCID logo   Alison J. Edwards,   Mate Erdelyi,   Catharine Esterhuysen, ORCID logo   Marc Fourmigué, ORCID logo   Pierre Kennepohl, ORCID logo   Lucia Myongwon Lee, ORCID logo   Marta E. G. Mosquera,   Jane S. Murray,   Chantal L. Mustoe,   William T. Pennington,   Peter Politzer,   Kevin E. Riley,   Sergiy V. Rosokha, ORCID logo   Steve Scheiner,   Mark S. Taylor, ORCID logo   Seiji Tsuzuki, ORCID logo   Ignacio Vargas-Baca ORCID logo  and  Yijue Xu  

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The halogen bond in solution: general discussion

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Article information

DOI
https://doi.org/10.1039/C7FD90063E
Article type
Discussion
First published
29 Sep 2017

Faraday Discuss., 2017,203, 347-370

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The halogen bond in solution: general discussion

C. B. Aakeröy, P. D. Beer, N. K. Beyeh, L. Brammer, M. Branca, D. L. Bryce, J. E. Del Bene, A. J. Edwards, M. Erdelyi, C. Esterhuysen, M. Fourmigué, P. Kennepohl, L. M. Lee, M. E. G. Mosquera, J. S. Murray, C. L. Mustoe, W. T. Pennington, P. Politzer, K. E. Riley, S. V. Rosokha, S. Scheiner, M. S. Taylor, S. Tsuzuki, I. Vargas-Baca and Y. Xu, Faraday Discuss., 2017, 203, 347 DOI: 10.1039/C7FD90063E

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