Using ZnO–Cr2O3–ZnO heterostructures to characterize polarization penetration depth through non-polar films

Abstract

The ability to affect the surface properties of non-polar Cr₂O₃ films through polar ZnO(0001) and (000) supports was investigated by characterizing the polarity of ZnO films grown on top of the Cr₂O₃ surfaces. The growth and geometric and electronic structures of the ZnO films were characterized with X-ray photoelectron spectroscopy, ultra-violet photoelectron spectroscopy, reflection high-energy electron diffraction, low-energy electron diffraction, and X-ray diffraction. The ZnO growth mode was Stranski–Krastanov, which can be attributed to the ZnO layers initially adopting a non-polar structure with a lower surface tension before transitioning to the polar bulk structure with a higher surface energy. A similar result has been reported for ZnO growth on α-Al₂O₃(0001), which is isostructural with Cr₂O₃. The polarity of the added ZnO layer was determined by examining the surface morphology following wet chemical etching with atomic force microscopy and by characterizing the surface reactivity via temperature-programmed desorption of alcohols, which strongly depends on the ZnO polarization direction. Consistent with prior work on ZnO growth on bulk Cr₂O₃(0001), both measurements indicate that thick Cr₂O₃ layers support ZnO(000) growth regardless of the underlying ZnO substrate polarization; however, the polarization direction of ZnO films grown on Cr₂O₃ films less than three repeat units thick follows the direction of the underlying substrate polarization. These findings show that it is possible to manipulate the surface properties of non-polar materials with a polar substrate, but that the effect does not penetrate past just a couple of repeat units.