A facile synthesis of reduced holey graphene oxide for supercapacitors†
Abstract
Hydroxyl radicals (˙OH) generated from a UV/O3 solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor electrode material and exhibits high specific capacitance (224 F g−1 at a current density of 1 A g−1) and high volumetric capacitance (up to 206 F cm−3).
 
                




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