Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 46, 2017
Previous Article Next Article

Probing plasma fluorinated graphene via spectromicroscopy

Author affiliations

Abstract

Plasma fluorination of graphene is studied using a combination of spectroscopy and microscopy techniques, giving insight into the yield and fluorination mechanism for functionalization of supported graphene with both CF4 and SF6 gas precursors. Ion acceleration during fluorination is used to probe the effect on grafting functionalities. Adatom clustering, which occurs with CF4 plasma treatment, is suppressed when higher kinetic energy is supplied to the ions. During SF6 plasma functionalization, the sulfur atoms tend to bond to bare copper areas instead of affecting the graphene chemistry, except when the kinetic energy of the ions is restricted. Using scanning photoelectron microscopy, with a 100 nm spatial resolution, the chemical bonding environment is evaluated in the fluorinated carbon network at selected regions and the functionalization homogeneity is controlled in individual graphene flakes.

Graphical abstract: Probing plasma fluorinated graphene via spectromicroscopy

Back to tab navigation

Supplementary files

Article information


Submitted
04 Aug 2017
Accepted
12 Nov 2017
First published
13 Nov 2017

Phys. Chem. Chem. Phys., 2017,19, 31418-31428
Article type
Paper

Probing plasma fluorinated graphene via spectromicroscopy

C. Struzzi, M. Scardamaglia, N. Reckinger, H. Sezen, M. Amati, L. Gregoratti, J.-F. Colomer, C. Ewels, R. Snyders and C. Bittencourt, Phys. Chem. Chem. Phys., 2017, 19, 31418
DOI: 10.1039/C7CP05305C

Social activity

Search articles by author

Spotlight

Advertisements