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Issue 45, 2016, Issue in Progress
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Eco-friendly photolithography using water-developable pure silk fibroin

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Abstract

We report that pure silk fibroin can be a green and biofunctional photoresist for deep ultraviolet photolithography. All processes are entirely water-based, from resist solvent to resist removal, and rely on the phototendering effect that decreases the crystallinity of silk fibroin films by DUV exposure. Additionally, the potential decrease in activity of bio-dopants due to high-energy irradiation is irrelevant to our positive-tone lithographic method.

Graphical abstract: Eco-friendly photolithography using water-developable pure silk fibroin

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Publication details

The article was received on 19 Feb 2016, accepted on 28 Mar 2016 and first published on 14 Apr 2016


Article type: Communication
DOI: 10.1039/C6RA04516B
RSC Adv., 2016,6, 39330-39334

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    Eco-friendly photolithography using water-developable pure silk fibroin

    J. Park, S. Lee, B. Marelli, M. Lee, T. Kim, H. Oh, H. Jeon, F. G. Omenetto and S. Kim, RSC Adv., 2016, 6, 39330
    DOI: 10.1039/C6RA04516B

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