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Issue 5, 2016
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Synthesis and characterization of a photosensitive organic–inorganic, hybrid positive resin type material: application to the manufacture of microfluidic devices by laser writing

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Abstract

A positive working and chemical amplified photosensitive organic–inorganic hybrid material based on PAA polymer with a lower molecular weight, 1,3,5-tris[(2-vinyloxy)ethoxy]benzene (TVEB) as a crosslinking dissolution inhibitor, a VEPTES pre-hydrolysed as an organic–inorganic material and a PAG photoacid generator was developed. The TVEB was prepared by coupling 1,3,5-trihydroxybenzene and 2-chloroethyl vinyl ether. The hybrid photosensitive material showed sensitivity when exposed to UV light at 375 nm followed by development with a 2.38 wt% aqueous solution of TMAH at room temperature. The synthesis of the material was followed by FTIR spectroscopy to follow the crosslinking of the vinyl ether group from TVEB and VEPTES with the carboxylic group of the PAA polymer.

Graphical abstract: Synthesis and characterization of a photosensitive organic–inorganic, hybrid positive resin type material: application to the manufacture of microfluidic devices by laser writing

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Article information


Submitted
14 Oct 2015
Accepted
11 Dec 2015
First published
07 Jan 2016

RSC Adv., 2016,6, 3951-3959
Article type
Paper

Synthesis and characterization of a photosensitive organic–inorganic, hybrid positive resin type material: application to the manufacture of microfluidic devices by laser writing

E. Mechref, J. Jabbour, S. Calas-Etienne, K. Amro, A. Mehdi, R. Tauk, D. Zaouk and P. Etienne, RSC Adv., 2016, 6, 3951
DOI: 10.1039/C5RA21393B

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