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Issue 9, 2016
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3D nanostructures fabricated by advanced stencil lithography

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This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.

Graphical abstract: 3D nanostructures fabricated by advanced stencil lithography

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The article was received on 28 Nov 2015, accepted on 05 Feb 2016 and first published on 05 Feb 2016

Article type: Communication
DOI: 10.1039/C5NR08444J
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Citation: Nanoscale, 2016,8, 4945-4950

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    3D nanostructures fabricated by advanced stencil lithography

    F. Yesilkoy, V. Flauraud, M. Rüegg, B. J. Kim and J. Brugger, Nanoscale, 2016, 8, 4945
    DOI: 10.1039/C5NR08444J

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