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Issue 9, 2016
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3D nanostructures fabricated by advanced stencil lithography

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Abstract

This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.

Graphical abstract: 3D nanostructures fabricated by advanced stencil lithography

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Article information


Submitted
28 Nov 2015
Accepted
05 Feb 2016
First published
05 Feb 2016

Nanoscale, 2016,8, 4945-4950
Article type
Communication
Author version available

3D nanostructures fabricated by advanced stencil lithography

F. Yesilkoy, V. Flauraud, M. Rüegg, B. J. Kim and J. Brugger, Nanoscale, 2016, 8, 4945
DOI: 10.1039/C5NR08444J

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