Jump to main content
Jump to site search

Volume 191, 2016
Previous Article Next Article

Self-folding nanostructures with imprint patterned surfaces (SNIPS)

Author affiliations


A significant need in nanotechnology is the development of methods to mass-produce three-dimensional (3D) nanostructures and their ordered assemblies with patterns of functional materials such as metals, ceramics, device grade semiconductors, and polymers. While top-down lithography approaches can enable heterogeneous integration, tunability, and significant material versatility, these methods enable inherently two-dimensional (2D) patterning. Bottom-up approaches enable mass-production of 3D nanostructures and their assemblies but with limited precision, and tunability in surface patterning. Here, we demonstrate a methodology to create Self-folding Nanostructures with Imprint Patterned Surfaces (SNIPS). By a variety of examples, we illustrate that SNIPS, either individually or in ordered arrays, are mass-producible and have significant tunability, material heterogeneity, and patterning precision.

Back to tab navigation

Supplementary files

Publication details

The article was received on 22 Feb 2016, accepted on 24 Feb 2016 and first published on 02 Mar 2016

Article type: Paper
DOI: 10.1039/C6FD00021E
Faraday Discuss., 2016,191, 61-71

  •   Request permissions

    Self-folding nanostructures with imprint patterned surfaces (SNIPS)

    H. R. Kwag, J. Cho, S. Park, J. Park and D. H. Gracias, Faraday Discuss., 2016, 191, 61
    DOI: 10.1039/C6FD00021E

Search articles by author