Jump to main content
Jump to site search

Issue 57, 2016
Previous Article Next Article

Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

Author affiliations

Abstract

This paper describes the fabrication of TiO2 overlayers by atomic layer deposition to passivate the surface states on Ta3N5 thin film anodes for photoelectrochemical water oxidation. The removal of surface states reduces the overpotential and decreases the density of surface recombination centers, resulting in enhanced activity through effective utilization of photogenerated charge carriers.

Graphical abstract: Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

Back to tab navigation

Supplementary files

Article information


Submitted
23 Apr 2016
Accepted
03 Jun 2016
First published
03 Jun 2016

Chem. Commun., 2016,52, 8806-8809
Article type
Communication

Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

P. Zhang, T. Wang and J. Gong, Chem. Commun., 2016, 52, 8806
DOI: 10.1039/C6CC03411J

Social activity

Search articles by author

Spotlight

Advertisements