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Issue 2, 2015
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Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

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Abstract

A polycyclosilane precursor was synthesized to develop soluble silicon materials and silicon thin films with optical properties at 193 nm, high silicon content, and etch selectivity for O2 and CFx plasmas. A new class of polycyclosilane–polysiloxane hybrid materials and their thin films exhibited good etch selectivity and good optical properties at 193 nm without organic absorbents.

Graphical abstract: Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

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Publication details

The article was received on 27 Aug 2014, accepted on 09 Nov 2014 and first published on 12 Nov 2014


Article type: Communication
DOI: 10.1039/C4TC01917B
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J. Mater. Chem. C, 2015,3, 239-242

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    Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

    S. J. Park, H. M. Cho, M. E. Lee, M. Kim, K. Han, S. Hong, S. Lim, H. Lee, B. Hwang, S. K. Kim, S. Shim, P. Kang and M. Choi, J. Mater. Chem. C, 2015, 3, 239
    DOI: 10.1039/C4TC01917B

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