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Issue 41, 2015
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Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

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Abstract

Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented.

Graphical abstract: Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

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Article information


Submitted
02 Mar 2015
Accepted
27 Mar 2015
First published
27 Mar 2015

RSC Adv., 2015,5, 32034-32063
Article type
Review Article
Author version available

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

V. Yu. Vasilyev, N. B. Morozova, T. V. Basova, I. K. Igumenov and A. Hassan, RSC Adv., 2015, 5, 32034
DOI: 10.1039/C5RA03566J

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