Issue 40, 2015

Controlled evaporative self-assembly of Fe3O4 nanoparticles assisted by an external magnetic field

Abstract

High fidelity and regularity structures of nanoscale materials has opened up new opportunities for developing miniaturized devices. A simple yet robust approach of magnetic field assisted controlled evaporative self-assembly (CESA) is developed to achieve Fe3O4 nanoparticle (NP) micro- and nano-patterns in a two dimensional (2D) direction. In the magnetic field assisted CESA process, the self-assembly morphology can be well controlled by varying extrinsic and intrinsic variables such as temperature, external magnetic field, and concentration of Fe3O4 NPs. Under the optimized magnetic field rotation frequency and temperature, 2D self-assembly of Fe3O4 NPs can be well realized. In addition, as photoactive sites, double bonds on the surface of Fe3O4 NPs allow the growth of polymer brushes by self-initiated photografting and photopolymerization (SIPGP), and the further achievement of free-standing magnetic composite films with well-defined patterns.

Graphical abstract: Controlled evaporative self-assembly of Fe3O4 nanoparticles assisted by an external magnetic field

Supplementary files

Article information

Article type
Paper
Submitted
04 Feb 2015
Accepted
25 Mar 2015
First published
27 Mar 2015

RSC Adv., 2015,5, 31519-31524

Controlled evaporative self-assembly of Fe3O4 nanoparticles assisted by an external magnetic field

Y. Men, W. Wang, P. Xiao, J. Gu, A. Sun, Y. Huang, J. Zhang and T. Chen, RSC Adv., 2015, 5, 31519 DOI: 10.1039/C5RA02160J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements