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Issue 39, 2015
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Silica–gold bilayer-based transfer of focused ion beam-fabricated nanostructures

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Abstract

The demand for using nanostructures fabricated by focused ion beam (FIB) on delicate substrates or as building blocks for complex devices motivates the development of protocols that allow FIB-fabricated nanostructures to be transferred from the original substrate to the desired target. However, transfer of FIB-fabricated nanostructures is severely hindered by FIB-induced welding of structure and substrate. Here we present two (ex and in situ) transfer methods for FIB-fabricated nanostructures based on a silica–gold bilayer evaporated onto a bulk substrate. Utilizing the poor adhesion between silica and gold, the nanostructures can be mechanically separated from the bulk substrate. For the ex situ transfer, a spin-coated poly(methyl methacrylate) film is used to carry the nanostructures so that the bilayer can be etched away after being peeled off. For the in situ transfer, using a micro-manipulator inside the FIB machine, a cut-out piece of silica on which a nanostructure has been fabricated is peeled off from the bulk substrate and thus carries the nanostructure to a target substrate. We demonstrate the performance of both methods by transferring plasmonic nano-antennas fabricated from single-crystalline gold flakes by FIB milling to a silicon wafer and to a scanning probe tip.

Graphical abstract: Silica–gold bilayer-based transfer of focused ion beam-fabricated nanostructures

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Article information


Submitted
26 Jun 2015
Accepted
13 Sep 2015
First published
15 Sep 2015

Nanoscale, 2015,7, 16427-16433
Article type
Paper
Author version available

Silica–gold bilayer-based transfer of focused ion beam-fabricated nanostructures

X. Wu, P. Geisler, E. Krauss, R. Kullock and B. Hecht, Nanoscale, 2015, 7, 16427
DOI: 10.1039/C5NR04262C

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