Issue 35, 2015

Large-scale freestanding nanometer-thick graphite pellicles for mass production of nanodevices beyond 10 nm

Abstract

Extreme ultraviolet lithography (EUVL) has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10 nm. We present a new pellicle material, nanometer-thick graphite film (NGF), which shows an extreme ultraviolet (EUV) transmission of 92% at a thickness of 18 nm. The maximum temperature induced by laser irradiation (λ = 800 nm) of 9.9 W cm−2 was 267 °C, due to the high thermal conductivity of the NGF. The freestanding NGF was found to be chemically stable during annealing at 500 °C in a hydrogen environment. A 50 × 50 mm large area freestanding NGF was fabricated using the wet and dry transfer (WaDT) method. The NGF can be used as an EUVL pellicle for the mass production of nanodevices beyond 10 nm.

Graphical abstract: Large-scale freestanding nanometer-thick graphite pellicles for mass production of nanodevices beyond 10 nm

Supplementary files

Article information

Article type
Communication
Submitted
11 May 2015
Accepted
24 Jun 2015
First published
29 Jun 2015

Nanoscale, 2015,7, 14608-14611

Author version available

Large-scale freestanding nanometer-thick graphite pellicles for mass production of nanodevices beyond 10 nm

S. Kim, D. Shin, T. Kim, S. Kim, J. H. Lee, C. G. Lee, C. Yang, S. Lee, S. J. Cho, H. C. Jeon, M. J. Kim, B. Kim and J. Yoo, Nanoscale, 2015, 7, 14608 DOI: 10.1039/C5NR03079J

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