Issue 20, 2015

Carrier transport at the metal–MoS2 interface


This study illustrates the nature of electronic transport and its transition from one mechanism to another between a metal electrode and MoS2 channel interface in a field effect transistor (FET) device. Interestingly, measurements of the contact resistance (Rc) as a function of temperature indicate a transition in the carrier transport across the energy barrier from thermionic emission at a high temperature to tunneling at a low temperature. Furthermore, at a low temperature, the nature of the tunneling behavior is ascertained by the current–voltage dependency that helps us feature direct tunneling at a low bias and Fowler–Nordheim tunneling at a high bias for a Pd–MoS2 contact due to the effective barrier shape modulation by biasing. In contrast, only direct tunneling is observed for a Cr–MoS2 contact over the entire applied bias range. In addition, simple analytical calculations were carried out to extract Rc at the gating range, and the results are consistent with the experimental data. Our results describe the transition in carrier transport mechanisms across a metal–MoS2 interface, and this information provides guidance for the design of future flexible, transparent electronic devices based on 2-dimensional materials.

Graphical abstract: Carrier transport at the metal–MoS2 interface

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Article information

Article type
13 Feb 2015
13 Apr 2015
First published
14 Apr 2015
This article is Open Access
Creative Commons BY license

Nanoscale, 2015,7, 9222-9228

Carrier transport at the metal–MoS2 interface

F. Ahmed, M. S. Choi, X. Liu and W. J. Yoo, Nanoscale, 2015, 7, 9222 DOI: 10.1039/C5NR01044F

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