Jump to main content
Jump to site search

Issue 65, 2015
Previous Article Next Article

Exfoliated semiconducting pure 2H-MoS2 and 2H-WS2 assisted by chlorosulfonic acid

Author affiliations

Abstract

Chlorosulfonic acid assisted the exfoliation of MoS2 and WS2 resulting in retaining their semiconducting 2H-phase, sharply contrasting the semiconducting-to-metallic phase-transition observed with the currently available exfoliation techniques.

Graphical abstract: Exfoliated semiconducting pure 2H-MoS2 and 2H-WS2 assisted by chlorosulfonic acid

Back to tab navigation

Supplementary files

Publication details

The article was received on 08 Jun 2015, accepted on 06 Jul 2015 and first published on 06 Jul 2015


Article type: Communication
DOI: 10.1039/C5CC04689K
Chem. Commun., 2015,51, 12950-12953

  •   Request permissions

    Exfoliated semiconducting pure 2H-MoS2 and 2H-WS2 assisted by chlorosulfonic acid

    G. Pagona, C. Bittencourt, R. Arenal and N. Tagmatarchis, Chem. Commun., 2015, 51, 12950
    DOI: 10.1039/C5CC04689K

Search articles by author

Spotlight

Advertisements