K. M. Zwoliński, P. Nowak and M. J. Chmielewski
Chem. Commun., 2015,51, 10030-10033
DOI:
10.1039/C5CC03469H,
Communication
The contaminant commonly found in the important amino-substituted metal–organic framework UiO-66-NH2 has been shown to arise from partial formylation during the synthesis in DMF. Mild conditions have now been developed for both post-synthetic deformylation and near-complete formylation, offering a new post-synthetic protection–deprotection method for the synthesis of multifunctional MOFs.
