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Issue 11, 2015
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Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

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Abstract

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation.

Graphical abstract: Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

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Publication details

The article was received on 23 Sep 2014, accepted on 15 Dec 2014 and first published on 15 Dec 2014


Article type: Communication
DOI: 10.1039/C4CC07494G
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Citation: Chem. Commun., 2015,51, 2060-2063

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    Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

    A. W. H. Lee, B. K. Pilapil, H. W. Ng and B. D. Gates, Chem. Commun., 2015, 51, 2060
    DOI: 10.1039/C4CC07494G

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