Issue 62, 2015

Stable negative differential resistance in porphyrin based σ–π–σ monolayers grafted on silicon

Abstract

Two Si-based hybrid self-assembled monolayers were synthesized by electro-grafting two di-O-alkylated porphyrins as the σ–π–σ systems. The monolayers showed a stable and reversible negative differential resistance (NDR) property at room temperature. The monolayer, fabricated using the porphyrin with fluorophenyl groups was more compact and showed a tenfold peak-to-valley ratio (PVR) relative to the other similar system devoid of the fluorine atoms in the porphyrin moiety. This suggested better pre-organization of the former, possibly by hydrogen bonding through the electro-negative fluorine atoms.

Graphical abstract: Stable negative differential resistance in porphyrin based σ–π–σ monolayers grafted on silicon

Supplementary files

Article information

Article type
Paper
Submitted
20 May 2015
Accepted
01 Jun 2015
First published
01 Jun 2015
This article is Open Access
Creative Commons BY license

RSC Adv., 2015,5, 50234-50244

Author version available

Stable negative differential resistance in porphyrin based σ–π–σ monolayers grafted on silicon

K. Garg, C. Majumder, S. K. Gupta, D. K. Aswal, S. K. Nayak and S. Chattopadhyay, RSC Adv., 2015, 5, 50234 DOI: 10.1039/C5RA09484D

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements