Issue 70, 2015

Low temperature and controlled synthesis of Bi2(S1−xSex)3 thin films using a simple chemical route: effect of bath composition

Abstract

Nanostructured bismuth sulphoselenide (Bi2(S1−xSex)3) thin films have been synthesized using a simple, cost-effective chemical bath deposition (CBD) method at room temperature (300 K). Structural, compositional, morphological and optical characterization and photoelectrochemical performance testing of these Bi2(S1−xSex)3 thin films has been carried out. The X-ray diffraction (XRD) study demonstrates that these thin films are nanocrystalline in nature with pure orthorhombic crystal structures. X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDS) show that the deposited thin films are nearly stoichiometric in nature. Field emission scanning electron microscopy (FESEM) reveals different morphologies for the Bi2(S1−xSex)3 thin films. The linear nature of the plots seen in the UV-Vis-NIR absorption study confirms the direct allowed type of transition. JV measurements with a solar simulator were carried out for all samples and the highest photoconversion efficiency, 0.3845%, has been recorded for the Bi2Se3 thin film. The significant boost in photoelectrochemical (PEC) performance might be due to the larger surface area with lower dislocation density and microstrain with a lower level of grain boundary resistance of Bi2Se3 thin films.

Graphical abstract: Low temperature and controlled synthesis of Bi2(S1−xSex)3 thin films using a simple chemical route: effect of bath composition

Article information

Article type
Paper
Submitted
23 Apr 2015
Accepted
12 Jun 2015
First published
30 Jun 2015

RSC Adv., 2015,5, 57090-57100

Author version available

Low temperature and controlled synthesis of Bi2(S1−xSex)3 thin films using a simple chemical route: effect of bath composition

M. M. Salunkhe, K. V. Khot, S. H. Sahare, P. N. Bhosale and T. Bhave, RSC Adv., 2015, 5, 57090 DOI: 10.1039/C5RA07372C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements