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Issue 15, 2015
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Patterning microfluidic device wettability with spatially-controlled plasma oxidation

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Abstract

Microfluidic devices can form double emulsions with uniform properties, but require cumbersome fabrication steps to pattern their wettability. We demonstrate spatially-controlled plasma oxidation to create wettability patterns for forming double emulsions. Our method performs comparably to chemical techniques but is simpler, more reliable, and scalable to patterning large arrays of drop makers.

Graphical abstract: Patterning microfluidic device wettability with spatially-controlled plasma oxidation

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Article information


Submitted
06 Jun 2015
Accepted
18 Jun 2015
First published
18 Jun 2015

Lab Chip, 2015,15, 3163-3169
Article type
Paper
Author version available

Patterning microfluidic device wettability with spatially-controlled plasma oxidation

S. C. Kim, D. J. Sukovich and A. R. Abate, Lab Chip, 2015, 15, 3163
DOI: 10.1039/C5LC00626K

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