Aqueous solution/metal interfaces investigated in operando by photoelectron spectroscopy

O. Karslıoğlu; S. Nemšák; I. Zegkinoglou; A. Shavorskiy; M. Hartl; F. Salmassi; E. M. Gullikson; M. L. Ng; Ch. Rameshan; B. Rude; D. Bianculli; A. A. Cordones; S. Axnanda; E. J. Crumlin; P. N. Ross; C. M. Schneider; Z. Hussain; Z. Liu; C. S. Fadley; H. Bluhm

doi:10.1039/C5FD00003C

Aqueous solution/metal interfaces investigated in operando by photoelectron spectroscopy

O. Karslıoğlu,^a S. Nemšák,^b I. Zegkinoglou,†^a A. Shavorskiy,‡^a M. Hartl,^ac F. Salmassi,^d E. M. Gullikson,^d M. L. Ng,^e Ch. Rameshan,§^a B. Rude,^a D. Bianculli,ⁱ A. A. Cordones,^a S. Axnanda,¶^f E. J. Crumlin,^f P. N. Ross,^d C. M. Schneider,^b Z. Hussain,^f Z. Liu,*^fg C. S. Fadley*^dh and H. Bluhm*^a

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* Corresponding authors

^a Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
E-mail: HBluhm@lbl.gov

^b Peter-Grünberg-Institut PGI-6, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

^c Julius -Maximilians-Universität Würzburg, Sanderring 2, 97070 Würzburg, Germany

^d Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
E-mail: CSFadley@ucdavis.edu

^e SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025, USA

^f Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
E-mail: ZLiu2@lbl.gov

^g State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China

^h Department of Physics, University of California Davis, Davis, CA 95616, USA

ⁱ Engineering Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

Abstract

We describe a new in operando approach for the investigation of heterogeneous processes at solid/liquid interfaces with elemental and chemical specificity which combines the preparation of thin liquid films using the meniscus method with standing wave ambient pressure X-ray photoelectron spectroscopy [Nemšák et al., Nat. Commun., 5, 5441 (2014)]. This technique provides information about the chemical composition across liquid/solid interfaces with sub-nanometer depth resolution and under realistic conditions of solution composition and concentration, pH, as well as electrical bias. In this article, we discuss the basics of the technique and present the first results of measurements on KOH/Ni interfaces.

This article is part of the themed collection: Corrosion Chemistry

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Aqueous solution/metal interfaces investigated in operando by photoelectron spectroscopy

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