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Issue 41, 2014
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A UV-absorber bismuth(III)-N-methyldiethanolamine complex as a low-temperature precursor for bismuth-based oxide thin films

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Abstract

Novel synthetic methods in solution that reduce the formation temperature of bismuth-based electronic oxides are essential for their successful integration with substrates of low thermal stability within micro- and flexible-electronic devices. This has become crucial for these oxides, since they appear as promising low-toxic functional materials alternative to other electronic oxides containing heavy metals. However, this is a challenge, since the crystallization of bismuth oxides occurs at high temperatures. To overcome these problems, we synthesize here a UV-absorber charge transfer metal complex in solution between the Bi(III) ion and an alkanolamine, N-methyldiethanolamine (Bi(III)–mdea). We take advantage of the photoreactivity of this complex to prepare bismuth-based oxide thin films at low temperature, which cannot be achieved by traditional thermal processing methods. Room temperature stable oxide thin films of the high-temperature δ-Bi2O3 phase are prepared from these solutions by UV-irradiation and annealing at 350 °C. The efficiency of this synthetic strategy is additionally proven for the low temperature preparation of thin films of much more complex bismuth based functional oxides: the multiferroic bismuth ferrite, BiFeO3, and the relaxor-ferroelectric perovskite of bismuth, sodium and barium titanate, (Bi0.5Na0.5)0.945Ba0.055TiO3.

Graphical abstract: A UV-absorber bismuth(iii)-N-methyldiethanolamine complex as a low-temperature precursor for bismuth-based oxide thin films

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Publication details

The article was received on 09 May 2014, accepted on 20 Aug 2014 and first published on 28 Aug 2014


Article type: Paper
DOI: 10.1039/C4TC00960F
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Citation: J. Mater. Chem. C, 2014,2, 8750-8760
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    A UV-absorber bismuth(III)-N-methyldiethanolamine complex as a low-temperature precursor for bismuth-based oxide thin films

    D. Pérez-Mezcua, R. Sirera, R. Jiménez, I. Bretos, C. De Dobbelaere, A. Hardy, M. K. Van Bael and M. L. Calzada, J. Mater. Chem. C, 2014, 2, 8750
    DOI: 10.1039/C4TC00960F

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