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Issue 41, 2014
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Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings

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Abstract

Conformal atomic layer deposition (ALD) of Al2O3 and TiO2 thin films on Kevlar®, poly(p-phenylene terephthalamide) (PPTA) fibers at 50 and 100 °C affects the fiber cut resistance. Systematic studies of ALD coatings between 10 to 400 Å thick formed at 50 and 100 °C revealed excellent conformality, and trends in cutting performance depended on materials and process details. A 50 Å/50 Å TiO2/Al2O3 bilayer formed at 50 °C increased cut resistance of PPTA by 30% compared to untreated fiber materials. In situ infrared analysis shows that trimethylaluminum (TMA) Al2O3 precursor reacts sub-surface with PPTA and tends to degraded mechanical performance. The TiCl4 TiO2 precursor reacts to form a barrier that limits TMA/PPTA interactions, allowing a harder Al2O3 layer to form on top of TiO2. The thin ALD coatings do not substantially affect durability, flexibility, or weight of the PPTA, making ALD a potentially viable means to enhance the protective properties of Kevlar and other polymer fiber systems.

Graphical abstract: Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings

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Publication details

The article was received on 16 Jul 2014, accepted on 26 Aug 2014 and first published on 29 Aug 2014


Article type: Paper
DOI: 10.1039/C4TA03662J
J. Mater. Chem. A, 2014,2, 17371-17379

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    Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings

    S. E. Atanasov, C. J. Oldham, K. A. Slusarski, J. Taggart-Scarff, S. A. Sherman, K. J. Senecal, S. F. Filocamo, Q. P. McAllister, E. D. Wetzel and G. N. Parsons, J. Mater. Chem. A, 2014, 2, 17371
    DOI: 10.1039/C4TA03662J

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