Issue 20, 2014
From the journal:

Journal of Materials Chemistry A

Anodic electrodeposition of a porous nickel oxide–hydroxide film on passivated nickel foam for supercapacitors†

Lin Gu,a   Yewu Wang,*a   Ren Lu,a   Liao Guan,a   Xinsheng Pengb  and  Jian Sha*a  

* Corresponding authors

a Department of Physics & State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, P. R. China
E-mail: yewuwang@zju.edu.cn, phyjsha@zju.edu.cn
Fax: +86-571-87953746
Tel: +86-571-87953746

b State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou, P. R. China

Abstract

The response current of Ni foam in alkaline solutions can be reduced significantly by high-temperature annealing, making it more suitable for current collectors, and a porous NiO(OH) film deposited on the passivated 3D Ni foam by anodic electrodeposition shows an ultrahigh specific capacitance of 2302 F g−1 at 1 A g−1.

Graphical abstract: Anodic electrodeposition of a porous nickel oxide–hydroxide film on passivated nickel foam for supercapacitors

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Article information

DOI
https://doi.org/10.1039/C4TA00205A
Article type
Communication
Submitted
14 Jan 2014
Accepted
10 Mar 2014
First published
11 Mar 2014

J. Mater. Chem. A, 2014,2, 7161-7164

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Anodic electrodeposition of a porous nickel oxide–hydroxide film on passivated nickel foam for supercapacitors

L. Gu, Y. Wang, R. Lu, L. Guan, X. Peng and J. Sha, J. Mater. Chem. A, 2014, 2, 7161 DOI: 10.1039/C4TA00205A

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