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Issue 79, 2014
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Phosphorus-containing polymers from tetrakis-(hydroxymethyl)phosphonium sulfate III. A new hydrolysis-resistant tris(allyloxymethyl)phosphine oxide and its thiol-ene reaction under ultraviolet irradiation

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Abstract

Two kinds of new phosphorus-containing crosslinked polymer materials were prepared via thiol-ene photopolymerization and their properties were studied. In order to prepare these crosslinked polymer materials, multifunctional monomer tris(allyloxymethyl)phosphine oxide (TAOPO) was synthesized from an eco-friendly raw material, tetrakis(hydroxymethyl) phosphonium sulfate (THPS). Crosslinked poly(phosphine oxide) networks were then produced by a thiol-ene reaction in which TAOPO reacts with the two kinds of polythiol under ultraviolet (UV) irradiation. The new crosslinked polymers possess long-term hydrolysis-resistance property because the monomer TAOPO contains a phosphorus–carbon bond. The crosslinked polymers have a high gel content, high dielectric constant, low dielectric loss, and excellent transparency with a high refractive index and high Abbe number. DMA and TGA results indicated that all cured poly(phosphine oxide) were uniform networks and exhibited a high thermal stability.

Graphical abstract: Phosphorus-containing polymers from tetrakis-(hydroxymethyl)phosphonium sulfate iii. A new hydrolysis-resistant tris(allyloxymethyl)phosphine oxide and its thiol-ene reaction under ultraviolet irradiation

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Publication details

The article was received on 22 Jun 2014, accepted on 13 Aug 2014 and first published on 13 Aug 2014


Article type: Paper
DOI: 10.1039/C4RA06080F
Citation: RSC Adv., 2014,4, 41705-41713

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    Phosphorus-containing polymers from tetrakis-(hydroxymethyl)phosphonium sulfate III. A new hydrolysis-resistant tris(allyloxymethyl)phosphine oxide and its thiol-ene reaction under ultraviolet irradiation

    Z. Tan, C. Wu, M. Zhang, W. Lv, J. Qiu and C. Liu, RSC Adv., 2014, 4, 41705
    DOI: 10.1039/C4RA06080F

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