Using an orthogonal approach and one-pot method to simplify the synthesis of nonlinear optical (NLO) dendrimers†
Abstract
Through only two one-pot steps, a fourth generation NLO dendrimer (G4) was prepared in a total yield of 49.2%. As a result of the strong site-isolation effect of high generation dendrimers, G4 demonstrated a very large NLO coefficient, with a d33 value of 169 pm Vā1.