This website uses cookies to give you the best user experience. If you continue without changing your settings we'll assume you are happy to receive all RSC cookies. You can change your cookie settings by navigating to our Privacy and Cookies page and following the instructions. These instructions are also obtainable from the privacy link at the bottom of any RSC page.
Lite Version|Standard version
Home > Polymer Chemistry >
To gain access to this content please
Log in via your home Institution.
Log in with your member or subscriber username and password.
Download


Buy PDF Add PDF to Basket (£42.50*)
*Exclusive of taxes
This article contains 4 page(s)
Abstract | Cited by

Through only two one-pot steps, a fourth generation NLO dendrimer (G4) was prepared in a total yield of 49.2%. As a result of the strong site-isolation effect of high generation dendrimers, G4 demonstrated a very large NLO coefficient, with a d33 value of 169 pm V−1.

Graphical abstract: Using an orthogonal approach and one-pot method to simplify the synthesis of nonlinear optical (NLO) dendrimers

Page: ^ Top


Enter Keywords, author, title,reference, or DOI
Log in | Register