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Issue 3, 2014
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Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

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Abstract

Recently, a new approach to atomic layer deposition (ALD) has been developed that doesn't require vacuum and is much faster than conventional ALD. This is achieved by separating the precursors in space rather than in time. This approach is most commonly called Spatial ALD (SALD). In our lab we have been using/developing a novel atmospheric SALD system to fabricate active components for new generation solar cells, showing the potential of this novel technique for the fabrication of high quality materials that can be integrated into devices. In this minireview we will introduce the basics of SALD and illustrate its great potential by highlighting recent results in the field of photovoltaics.

Graphical abstract: Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

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Publication details

The article was received on 18 Nov 2013, accepted on 06 Feb 2014 and first published on 06 Feb 2014


Article type: Minireview
DOI: 10.1039/C3MH00136A
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Citation: Mater. Horiz., 2014,1, 314-320
  • Open access: Creative Commons BY license
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    Spatial atmospheric atomic layer deposition: a new laboratory and industrial tool for low-cost photovoltaics

    D. Muñoz-Rojas and J. MacManus-Driscoll, Mater. Horiz., 2014, 1, 314
    DOI: 10.1039/C3MH00136A

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