Issue 15, 2014

Oxygen vacancy formation and annihilation in lanthanum cerium oxide as a metal reactive oxide on 4H-silicon carbide

Abstract

A mechanism regarding the redox reaction in lanthanum cerium oxide (LaxCeyOz) post-deposition annealed in reducing and oxidizing atmosphere was schematized and discussed in association with the presence of lanthanum as a substitutional cation. Analyses have been performed using X-ray diffraction, energy-filtered transmission electron microscopy, scanning transmission electron microscope-energy dispersive spectroscopy line scan, and capacitance–voltage measurements. The results showed the presence of an oxygen vacancy when La3+ was in its substitution site, while annihilation of oxygen vacancy was accompanied by a displacement of La3+ from the substitutional site to the interstitial site via a kick-out mechanism prior to its disappearance from the CeO2.

Graphical abstract: Oxygen vacancy formation and annihilation in lanthanum cerium oxide as a metal reactive oxide on 4H-silicon carbide

Article information

Article type
Paper
Submitted
11 Dec 2013
Accepted
27 Jan 2014
First published
27 Jan 2014

Phys. Chem. Chem. Phys., 2014,16, 7015-7022

Oxygen vacancy formation and annihilation in lanthanum cerium oxide as a metal reactive oxide on 4H-silicon carbide

W. F. Lim and K. Y. Cheong, Phys. Chem. Chem. Phys., 2014, 16, 7015 DOI: 10.1039/C3CP55214D

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