Issue 75, 2014
From the journal:

Chemical Communications

Controllable atmospheric pressure growth of mono-layer, bi-layer and tri-layer graphene†

Jing Li,ab   Hengxing Ji,c   Xing Zhang,ab   Xuanyun Wang,d   Zhi Jin,d   Dong Wang*a  and  Li-Jun Wan*a  

* Corresponding authors

a Key Laboratory of Molecular Nanostructure and Nanotechnology and Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences (CAS), Beijing 100190, P.R. China
E-mail: wangd@iccas.ac.cn, wanlijun@iccas.ac.cn

b University of CAS, Beijing 100049, P.R. China

c Department of Materials Science & Engineering, University of Science and Technology of China, 96 Jinzhai Road, Hefei, Anhui 230026, P.R. China

d Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, P.R. China

Abstract

Here we report a three-step growth method for high-quality mono-layer, bi-layer and tri-layer graphene with coverage ∼90% at atmospheric pressure. The growth temperature and gas flow rate have been found to be the key factors. This method would be of great importance for the large scale production of graphene with defined thickness.

Graphical abstract: Controllable atmospheric pressure growth of mono-layer, bi-layer and tri-layer graphene

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C4CC04928D
Article type
Communication
Submitted
27 Jun 2014
Accepted
28 Jul 2014
First published
28 Jul 2014

Chem. Commun., 2014,50, 11012-11015

Author version available

Download author version (PDF)

Permissions

Request permissions

Controllable atmospheric pressure growth of mono-layer, bi-layer and tri-layer graphene

J. Li, H. Ji, X. Zhang, X. Wang, Z. Jin, D. Wang and L. Wan, Chem. Commun., 2014, 50, 11012 DOI: 10.1039/C4CC04928D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements