Jump to main content
Jump to site search

Issue 1, 2014
Previous Article Next Article

Rheology printing for metal-oxide patterns and devices

Author affiliations

Abstract

Technologies of device printing have been widely explored, but existing printing techniques still cannot produce well-defined patterns required by fine electronic devices. Here, a new printing method is proposed and the printing of metal-oxide patterns with well-defined shapes was demonstrated. Excellent thin-film transistors with channel lengths around 500 nm were completely printed by this method in an air atmosphere. This printing utilizes a viscoelastic transformation of the precursor gel when imprinted; it softens at a certain temperature during thermal-imprinting so that the gel can be rheologically imprinted. The imprinted pattern shows very small shrinkage during post-annealing, thereby achieving a high shape fidelity to the mould; this results from metal-oxide condensation at imprinting. The viscoelastic transformation and metal-oxide condensation at imprinting constitute the basis for this printing method, which is closely related to the cluster structure in the precursor gel. This method has worked for patterns down to several tens of nanometers.

Graphical abstract: Rheology printing for metal-oxide patterns and devices

Back to tab navigation

Supplementary files

Article information


Submitted
17 Sep 2013
Accepted
31 Oct 2013
First published
01 Nov 2013

J. Mater. Chem. C, 2014,2, 40-49
Article type
Paper

Rheology printing for metal-oxide patterns and devices

T. Kaneda, D. Hirose, T. Miyasako, P. T. Tue, Y. Murakami, S. Kohara, J. Li, T. Mitani, E. Tokumitsu and T. Shimoda, J. Mater. Chem. C, 2014, 2, 40
DOI: 10.1039/C3TC31842G

Social activity

Search articles by author

Spotlight

Advertisements