Photoelectrochemical properties of chemically exfoliated MoS2†
Abstract
Group 6 transition metal dichalcogenides (TMD) such as MoS2 are promising candidates for photocatalysis and photoelectrochemical applications. Despite their promise, scalable deposition of thin films remains a challenge for TMD-based photoanodes. Here we investigate the photoelectrochemical properties of ultra-thin films of chemically exfoliated MoS2 and its composites with TiO2