Issue 11, 2013

Bipolar one diode–one resistor integration for high-density resistive memory applications

Abstract

Different from conventional unipolar-type 1D–1R RRAM devices, a bipolar-type 1D–1R memory device concept is proposed and successfully demonstrated by the integration of Ni/TiOx/Ti diode and Pt/HfO2/Cu bipolar RRAM cell to suppress the undesired sneak current in a cross-point array. The bipolar 1D–1R memory device not only achieves self-compliance resistive switching characteristics by the reverse bias current of the Ni/TiOx/Ti diode, but also exhibits excellent bipolar resistive switching characteristics such as uniform switching, satisfactory data retention, and excellent scalability, which give it high potentiality for high-density integrated nonvolatile memory applications.

Graphical abstract: Bipolar one diode–one resistor integration for high-density resistive memory applications

Article information

Article type
Paper
Submitted
29 Oct 2012
Accepted
18 Mar 2013
First published
21 Mar 2013

Nanoscale, 2013,5, 4785-4789

Bipolar one diode–one resistor integration for high-density resistive memory applications

Y. Li, H. Lv, Q. Liu, S. Long, M. Wang, H. Xie, K. Zhang, Z. Huo and M. Liu, Nanoscale, 2013, 5, 4785 DOI: 10.1039/C3NR33370A

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