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Issue 23, 2013
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Electrofluidics fabricated by space-selective metallization in glass microfluidic structures using femtosecond laser direct writing

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Abstract

Space-selective metallization of the inside of glass microfluidic structures using femtosecond laser direct-write ablation followed by electroless plating is demonstrated. Femtosecond laser direct writing followed by thermal treatment and successive chemical etching allows us to fabricate three-dimensional microfluidic structures inside photosensitive glass. Then, femtosecond laser ablation followed by electroless metal plating enables flexible deposition of patterned metal films on desired locations of not only the top and bottom walls but also the sidewalls of fabricated microfluidic structures. A volume writing scheme for femtosecond laser irradiation inducing homogeneous ablation on the sidewalls of microfluidic structures is proposed for sidewall metallization. The developed technique is used to fabricate electrofluidics in which microelectric components are integrated into glass microchannels. The fabricated electrofluidics are applied to control the temperature of liquid samples in the microchannels for the enhancement of chemical reactions and to manipulate the movement of biological samples in the microscale space.

Graphical abstract: Electrofluidics fabricated by space-selective metallization in glass microfluidic structures using femtosecond laser direct writing

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Article information


Submitted
20 Aug 2013
Accepted
16 Sep 2013
First published
17 Sep 2013

Lab Chip, 2013,13, 4608-4616
Article type
Paper

Electrofluidics fabricated by space-selective metallization in glass microfluidic structures using femtosecond laser direct writing

J. Xu, D. Wu, Y. Hanada, C. Chen, S. Wu, Y. Cheng, K. Sugioka and K. Midorikawa, Lab Chip, 2013, 13, 4608
DOI: 10.1039/C3LC50962A

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