Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation†
Abstract
Boron-doped titanium dioxide (B-TiO2) films were deposited by
* Corresponding authors
a
Department of Chemistry, University College London, 20 Gordon Street, London, UK
E-mail:
i.p.parkin@ucl.ac.uk
Fax: +44 (0)20 7697463
Tel: +44 (0)20 76794669
b School of Chemistry and Chemical Engineering, Queen's University Belfast, Stranmillis Road, Belfast BT9 5AG, UK
Boron-doped titanium dioxide (B-TiO2) films were deposited by
P. Carmichael, D. Hazafy, D. S. Bhachu, A. Mills, J. A. Darr and I. P. Parkin, Phys. Chem. Chem. Phys., 2013, 15, 16788 DOI: 10.1039/C3CP52665H
This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content