Enhanced sulfur resistance of Ni/SiO2catalyst for methanation via the plasma decomposition of nickel precursor
Abstract
A Ni/SiO2
- This article is part of the themed collection: Interfacial Phenomena in (De)hydrogenation Reactions
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* Corresponding authors
a
Advanced Nanotechnology Center, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China
E-mail:
ughg_cjl@yahoo.com
Fax: +86 22 27406490
b National Institute of Clean-and-Low-Carbon Energy, Beijing 102209, China
c School of Chemical Engineering and Bioengineering, Washington State University, Pullman, WA 99164-2710, USA
A Ni/SiO2
X. Yan, Y. Liu, B. Zhao, Y. Wang and C. Liu, Phys. Chem. Chem. Phys., 2013, 15, 12132 DOI: 10.1039/C3CP50694K
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