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Issue 12, 2013
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Nanopatterning by ion implantation through nanoporous alumina masks

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Abstract

The important problem of how to generate lateral order for ion implantation patterning of substrates is solved by using a nanoporous anodic alumina membrane as a mask. Co and Pt implantation is used at two implantation doses. In order to observe the achieved implantation zones free from artifacts, electron transparent thin nitride and oxide films are used as substrates, which allows the quality of pattern transfer from the mask to the thin film to be assessed by plan-view transmission electron microscopy. Characteristic density variations of implanted elements across projected pore-regions of the mask, such as ring and dome shapes, and corresponding variation of cluster size are discussed, and therefore the method also serves as a suitable test bed for ion beam focusing studies by cylindrical or conical pores.

Graphical abstract: Nanopatterning by ion implantation through nanoporous alumina masks

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Article information


Submitted
19 Jan 2013
Accepted
01 Feb 2013
First published
04 Feb 2013

Phys. Chem. Chem. Phys., 2013,15, 4291-4296
Article type
Communication

Nanopatterning by ion implantation through nanoporous alumina masks

W. Guan, I. M. Ross, U. M. Bhatta, J. Ghatak, N. Peng, B. J. Inkson and G. Möbus, Phys. Chem. Chem. Phys., 2013, 15, 4291
DOI: 10.1039/C3CP50196E

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