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Issue 12, 2013
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Nanopatterning by ion implantation through nanoporous alumina masks

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The important problem of how to generate lateral order for ion implantation patterning of substrates is solved by using a nanoporous anodic alumina membrane as a mask. Co and Pt implantation is used at two implantation doses. In order to observe the achieved implantation zones free from artifacts, electron transparent thin nitride and oxide films are used as substrates, which allows the quality of pattern transfer from the mask to the thin film to be assessed by plan-view transmission electron microscopy. Characteristic density variations of implanted elements across projected pore-regions of the mask, such as ring and dome shapes, and corresponding variation of cluster size are discussed, and therefore the method also serves as a suitable test bed for ion beam focusing studies by cylindrical or conical pores.

Graphical abstract: Nanopatterning by ion implantation through nanoporous alumina masks

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Publication details

The article was received on 19 Jan 2013, accepted on 01 Feb 2013 and first published on 04 Feb 2013

Article type: Communication
DOI: 10.1039/C3CP50196E
Citation: Phys. Chem. Chem. Phys., 2013,15, 4291-4296

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    Nanopatterning by ion implantation through nanoporous alumina masks

    W. Guan, I. M. Ross, U. M. Bhatta, J. Ghatak, N. Peng, B. J. Inkson and G. Möbus, Phys. Chem. Chem. Phys., 2013, 15, 4291
    DOI: 10.1039/C3CP50196E

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