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Issue 2, 2013
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Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching

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Abstract

We present a new approach for inducing the formation of unidirectionally slanted or curved silicon nanowires (SiNWs) via metal-assisted chemical etching by introducing various co-solvents to the etching solution. The effects of adding methanol, ethanol, 2-propanol, and acetonitrile to the HF–H2O2–H2O system are studied. It is demonstrated that simply by controlling the type and the amount of co-solvent, such wires can be fabricated over a large area and the wire curvature can be tuned.

Graphical abstract: Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching

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Article information


Submitted
23 Aug 2012
Accepted
19 Sep 2012
First published
01 Nov 2012

J. Mater. Chem. C, 2013,1, 220-224
Article type
Communication

Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching

Y. Kim, A. Tsao, D. H. Lee and R. Maboudian, J. Mater. Chem. C, 2013, 1, 220
DOI: 10.1039/C2TC00041E

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